Investigating ripple pattern formation and damage profiles in Si and Ge induced by 100 keV Ar⁺ ion beam: a comparative study

• Indra Sulania,
• Harpreet Sondhi,
• Tanuj Kumar,
• Sunil Ojha,
• G R Umapathy,
• Ambuj Mishra,
• Ambuj Tripathi,
• Richa Krishna,
• Devesh Kumar Avasthi and
• Yogendra Kumar Mishra

Beilstein J. Nanotechnol. 2024, 15, 367–375, doi:10.3762/bjnano.15.33

• structures. Although these structures may not be visible to the naked eye, they certainly have a visible impact on the mentioned applications. Nanopatterning is a very delicate procedure that is only possible with special techniques such as ion beam sputtering (IBS), with which one can achieve nanostructures

• understood. Despite controlled fabrication of patterns has been achieved, details that influence the process of self-assembly still remain open. Ion beam sputtering is an important method for inducing topographical changes in specific materials. For silicon, self-organized dots, ripples, and cones have been

Ultrasensitive and ultrastretchable metal crack strain sensor based on helical polydimethylsiloxane

• Shangbi Chen,
• Dewen Liu,
• Weiwei Chen,
• Huajiang Chen,
• Jiawei Li and
• Jinfang Wang

Beilstein J. Nanotechnol. 2024, 15, 270–278, doi:10.3762/bjnano.15.25

• ion beam sputtering was obtained from Fuzhou Yingfei Xun Photoelectric Tech Co., Ltd, China; it possessed a density of 19.3 g·cm−3 and a conductivity of 4.52 × 107 S·m−1. Silver conductive adhesive, which was procured from Shenzhen Ausbond Co., LTD. (Guangdong, China), was employed to affix copper

• structured PDMS was initially cleansed through a 5 min Ar plasma sputtering and, subsequently, coated with a 10 nm thick Ti adhesion layer. After that, ion beam sputtering was utilized to deposit a 50 nm thick Au thin film onto the outer surface of the helically shaped PDMS. Then, a controlled pre-stretch

A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope

• Frances I. Allen

Beilstein J. Nanotechnol. 2021, 12, 633–664, doi:10.3762/bjnano.12.52

• introduction of the HIM, ion beam-based lithography mainly relied on the gallium FIB, for which major drawbacks were ion beam sputtering of the resist and the relatively large beam spot size (several nanometers) with its significant beam tails. Helium ion beam lithography (HIBL) using the HIM is therefore a

Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beams

• Serguei Chiriaev,
• Luciana Tavares,
• Vadzim Adashkevich,
• Arkadiusz J. Goszczak and
• Horst-Günter Rubahn

Beilstein J. Nanotechnol. 2020, 11, 1693–1703, doi:10.3762/bjnano.11.151

• direct, maskless surface patterning with a superior lateral resolution and depth control [2][3]. The portfolio of the currently used FIB-based and FIB-assisted surface patterning techniques includes a number of different methods, such as ion-beam sputtering of surface layers (ion-beam milling), ion-beam

Sputtering of silicon nanopowders by an argon cluster ion beam

• Xiaomei Zeng,
• Vasiliy Pelenovich,
• Zhenguo Wang,
• Wenbin Zuo,
• Sergey Belykh,
• Alexander Tolstogouzov,
• Dejun Fu and
• Xiangheng Xiao

Beilstein J. Nanotechnol. 2019, 10, 135–143, doi:10.3762/bjnano.10.13

Near-field surface plasmon field enhancement induced by rippled surfaces

• Mario D’Acunto,
• Francesco Fuso,
• Ruggero Micheletto,
• Makoto Naruse,
• Francesco Tantussi and
• Maria Allegrini

Beilstein J. Nanotechnol. 2017, 8, 956–967, doi:10.3762/bjnano.8.97

• and height much smaller than the wavelength of typical plasmon resonances. Different top-down or bottom-up fabrication techniques have been introduced to produce metal nanostructures with active plasmonic reactivity [14]. For example, ion beam sputtering (IBS) is a widely employed bottom-up technique

• ion-beam sputtering (IBS) generally show a fractal structure, the function C in Equation 13 is chosen to be Gaussian, that is, a special case of a fractal surface with the Hurst exponent equal to one [47]: where a is known as the transverse autocorrelation length, as it describes the mean length

Obtaining and doping of InAs-QD/GaAs(001) nanostructures by ion beam sputtering

• Sergei N. Chebotarev,
• Alexander S. Pashchenko,
• Leonid S. Lunin,
• Elena N. Zhivotova,
• Georgy A. Erimeev and
• Marina L. Lunina

Beilstein J. Nanotechnol. 2017, 8, 12–20, doi:10.3762/bjnano.8.2

• and Solar Energy, Southern Scientific Center of Russian Academy of Sciences, 344006, 41, Chekhov Avenue, Rostov-on-Don, Russia 10.3762/bjnano.8.2 Abstract The features of InAs quantum dots obtained on GaAs(001) single-crystal substrates by ion-beam sputtering were investigated. It has been shown that

• barrier layer increases the intensity of photoluminescence peaks of the ground state and the first excited state of the InAs quantum dots. Keywords: 3D growth; doping; ion-beam sputtering; photoluminescence; quantum dots; Introduction Main interests of inorganic nanotechnology science are the study of

• epitaxy [8] and vapour phase epitaxy [9] are commonly used and well-understood techniques for obtaining such nanostructures. Besides the mentioned methods, classic growth methods such as liquid phase epitaxy [10], laser beam sputtering [11], electron beam sputtering [12] and ion beam sputtering [13] are

Magnetic switching of nanoscale antidot lattices

• Ulf Wiedwald,
• Joachim Gräfe,
• Kristof M. Lebecki,
• Maxim Skripnik,
• Felix Haering,
• Gisela Schütz,
• Paul Ziemann,
• Eberhard Goering and
• Ulrich Nowak

Beilstein J. Nanotechnol. 2016, 7, 733–750, doi:10.3762/bjnano.7.65

Nanoscale rippling on polymer surfaces induced by AFM manipulation

• Mario D’Acunto,
• Franco Dinelli and
• Pasqualantonio Pingue

Beilstein J. Nanotechnol. 2015, 6, 2278–2289, doi:10.3762/bjnano.6.234

• behavior can be obtained by sliding loads on unpaved roads, ski slopes and rail tracks. Similarly, ion-beam sputtering on metal or semiconductor substrates can produce ripples on the microscale and nanoscale. The first example, reported in the literature, showed that low energy ion erosion of glass

Near-field visualization of plasmonic lenses: an overall analysis of characterization errors

• Jing Wang,
• Yongqi Fu,
• Zongwei Xu and
• Fengzhou Fang

Beilstein J. Nanotechnol. 2015, 6, 2069–2077, doi:10.3762/bjnano.6.211

• the FIB point-by-point writing. Internal stress FIB bombardment with ion energies below 30 keV produces surface diffusion and tension down to about 30 nm underneath the surface of the etched structures. One by-product of ion beam sputtering is erosion. The arrival of ions on the sample surface is a

Current–voltage characteristics of manganite–titanite perovskite junctions

• Benedikt Ifland,
• Patrick Peretzki,
• Birte Kressdorf,
• Philipp Saring,
• Andreas Kelling,
• Michael Seibt and
• Christian Jooss

Beilstein J. Nanotechnol. 2015, 6, 1467–1484, doi:10.3762/bjnano.6.152

Photodetectors based on carbon nanotubes deposited by using a spray technique on semi-insulating gallium arsenide

• Domenico Melisi,
• Maria Angela Nitti,
• Marco Valentini,
• Antonio Valentini,
• Teresa Ligonzo,
• Giuseppe De Pascali and
• Marianna Ambrico

Beilstein J. Nanotechnol. 2014, 5, 1999–2006, doi:10.3762/bjnano.5.208

• layouts were used for the realization of the photodetectors (Figure 1). The first configuration, named single face sample (SFS), has a CNT layer sprayed on one face and a titanium/gold layer (30/50 nm), deposited by ion beam sputtering (IBS) [16], on the other face. The second one, named double face

Magnetic coupling mechanisms in particle/thin film composite systems

• Giovanni A. Badini Confalonieri,
• Philipp Szary,
• Durgamadhab Mishra,
• Maria J. Benitez,
• Mathias Feyen,
• An Hui Lu,
• Leonardo Agudo,
• Gunther Eggeler,
• Oleg Petracic and
• Hartmut Zabel

Beilstein J. Nanotechnol. 2010, 1, 101–107, doi:10.3762/bjnano.1.12

• the use of both chemical and physical growth methods. The composite material can be successfully prepared over areas larger than 100 mm2 and is obtained by combining chemical synthesis of the NPs, their mechanical self-assembly on top of a substrate, and ion-beam sputtering of a magnetic layer. All

• composites were prepared by a combination of spin-coating and ion-beam sputtering techniques. Ion-milling of the NP surface was used prior to Co sputtering for removing the oleic acid shell at the top of the NPs and to smooth out the interface prior to Co film deposition. This process was found to improve

• thin cobalt film of 20 nm thickness was grown on top of the NPs by ion-beam sputtering from a Co target at 3.9 × 10−4 mbar with a base pressure of 1 × 10−8 mbar. To prevent oxidation of the Co surface, the sample was finally capped with a 3 nm thick layer of Cu. A reference composite sample was